We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation.
A. W. H. Lee, B. K. Pilapil, H. W. Ng and B. D. Gates, Chem. Commun., 2015, 51, 2060 DOI: 10.1039/C4CC07494G
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