Issue 76, 2014

Metal-catalyst-free growth of carbon nanotubes/carbon nanofibers on carbon blacks using chemical vapor deposition

Abstract

Metal-catalyst-free growth of carbon nanostructures, e.g. carbon nanotubes (CNTs) or carbon nanofibers (CNFs), on typical materials is a promising route to achieve further applications without interference of unwanted metal catalysts. Here, we report that carbon black (CB) can act as a catalyst to controllably grow CNTs or CNFs yielding bi-functional hybrid structure-CNTs/CB or CNFs/CB through a metal-catalyst-free chemical vapour deposition (MCF-CVD) in a reaction temperature range of 800–1000 °C. We find that the decomposition steps of the carbon source are a crucial factor to determine the formation of CNTs (ethylene), CNFs (acetylene) or amorphous carbons (ethanol and cyclohexane) evidenced by the gas-composition analysis. The growth yields of CNTs or CNFs catalysed by various CBs display a linear trend corresponding with the surface areas of CBs, indicating that structural morphologies of CB dominate the growth of the carbon nanostructures. The formation of CNTs/CB or CNFs/CB is proposed to obey the vapour–solid–surface–solid model with an activation energy of 59.0 kJ mol−1. A growth mechanism of CNTs/CB or CNFs/CB is suggested involving a direct dehydrogenation route of carbon sources (ethylene and acetylene) occurring on the CB surfaces through self-assembly. The multi-step decomposition route of the carbon sources (ethanol and cyclohexane) would generate amorphous carbons only. These findings open a new route to prepare unique carbon structures through a metal-catalyst-free CVD.

Graphical abstract: Metal-catalyst-free growth of carbon nanotubes/carbon nanofibers on carbon blacks using chemical vapor deposition

Article information

Article type
Paper
Submitted
16 Apr 2014
Accepted
18 Aug 2014
First published
18 Aug 2014

RSC Adv., 2014,4, 40251-40258

Author version available

Metal-catalyst-free growth of carbon nanotubes/carbon nanofibers on carbon blacks using chemical vapor deposition

Z. Zeng and J. Lin, RSC Adv., 2014, 4, 40251 DOI: 10.1039/C4RA03456B

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