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Correction: Atomic layer deposition of a MoS2 film
Lee Kheng
Tan
ab,
Bo
Liu
c,
Jing Hua
Teng
b,
Shifeng
Guo
b,
Hong Yee
Low
d and
Kian Ping
Loh
*a
aDepartment of Chemistry and Graphene Research Centre, National University of Singapore, 3 Science Drive 3, Singapore 117543. E-mail: chmlohkp@nus.edu.sg
bA*STAR Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602
cDepartment of Physics and Graphene Research Centre, National University of Singapore, 2 Science Drive 3, Singapore 117551
dSingapore University of Technology and Design, 20 Dover Dr, Singapore 138682
First published on 7th October 2014
Abstract
Correction for ‘Atomic layer deposition of a MoS2 film’ by Lee Kheng Tan et al., Nanoscale, 2014, 6, 10584–10588.
(1) There is an error to the existing author list. The correct list should be:
Lee Kheng Tan,‡ab Bo Liu,‡c Jing Hua Teng,b Shifeng Guo,b Hong Yee Low,d Hui Ru Tan,b Christy Yuen Tung Chong,b Ren Bin Yang,b and Kian Ping Loh*a
(2) There is an error in the Acknowledgements. It should read:
We thank the Institute of Materials Research and Engineering under the Agency for Science, Technology and Research (A*STAR) Singapore as well as the Singapore-Berkeley Research Initiative for Sustainable Energy (SinBeRISE) CREATE Program for the financial support. We are grateful to Mr Lim Poh Chong for his assistance in XRD, Ms June Ong for her assistance in XPS and Dr Liu Hong Fei and Dr Jia Min Chin for their advice.
The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.
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