Atomic layer deposition and characterization of vanadium oxide thin films
Abstract
In this study, VOx films were grown by
* Corresponding authors
a
Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014, Helsinki, Finland
E-mail:
timothee.blanquart@helsinki.fi
b Institute for Solid State Electronics, Vienna University of Technology, A-1040, Vienna, Austria.
c Department of Applied Physics, Technische Universiteit Eindhoven, P.O. Box 513600, MB Eindhoven, The Netherlands
d Air Liquide Research & Development, DRTC 200 GBC Drive, Newark, 19702, USA
In this study, VOx films were grown by
T. Blanquart, J. Niinistö, M. Gavagnin, V. Longo, M. Heikkilä, E. Puukilainen, V. R. Pallem, C. Dussarrat, M. Ritala and M. Leskelä, RSC Adv., 2013, 3, 1179 DOI: 10.1039/C2RA22820C
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