Enhanced sulfur resistance of Ni/SiO2catalyst for methanation via the plasma decomposition of nickel precursor

Abstract

A Ni/SiO₂ catalyst was prepared by the plasma decomposition of a nickel precursor via dielectric barrier discharge (DBD). The obtained Ni/SiO₂ catalyst shows an enhanced H₂S resistance for methanation of syngas (CO + H₂). The plasma decomposition has a significant influence on the structural property of Ni/SiO₂. The plasma decomposed catalyst shows less defect sites on Ni particles. The formation of Ni–sulfur species was effectively inhibited. The mechanism of H₂S poisoning on different catalysts with and without plasma decomposition was also discussed according to the reaction temperature.