Issue 3, 2011

Hierarchically porous NiO film grown by chemical bath depositionvia a colloidal crystal template as an electrochemical pseudocapacitor material

Abstract

Hierarchically porous NiO film has been successfully prepared by chemical bath deposition through monolayer polystyrene sphere template. The film possesses an architecture with a substructure of NiO monolayer hollow-sphere array and a superstructure of porous net-like NiO nanoflakes. The pseudocapacitive behavior of the NiO film is investigated by cyclic voltammograms (CV) and galvanostatic charge-discharge tests in 1 M KOH. The hierarchically porous NiO film exhibits weaker polarization, better cycling performance and higher specific capacitance in comparison with the dense NiO film. The specific capacitance of the porous NiO film is 309 F g−1 at 1 A g−1 and 221 F g−1 at 40 A g−1, respectively, much higher than that of the dense NiO film (121 F g−1 at 1 A g−1 and 99 F g−1 at 40 A g−1). The hierarchically porous architecture is responsible for the enhancement of electrochemical properties.

Graphical abstract: Hierarchically porous NiO film grown by chemical bath deposition via a colloidal crystal template as an electrochemical pseudocapacitor material

Article information

Article type
Paper
Submitted
23 Aug 2010
Accepted
15 Sep 2010
First published
08 Nov 2010

J. Mater. Chem., 2011,21, 671-679

Hierarchically porous NiO film grown by chemical bath deposition via a colloidal crystal template as an electrochemical pseudocapacitor material

X. Xia, J. Tu, X. Wang, C. Gu and X. Zhao, J. Mater. Chem., 2011, 21, 671 DOI: 10.1039/C0JM02784G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements