GrapheneCVD growth on copper and nickel: role of hydrogen in kinetics and structure
Abstract
Understanding the chemical vapor deposition (
* Corresponding authors
a
Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari, Italy
E-mail:
maria.losurdo@ba.imip.cnr.it
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Tel: +39 080 5443562
Understanding the chemical vapor deposition (
M. Losurdo, M. M. Giangregorio, P. Capezzuto and G. Bruno, Phys. Chem. Chem. Phys., 2011, 13, 20836 DOI: 10.1039/C1CP22347J
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