Issue 28, 2011
From the journal:

Chemical Communications

2-Step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance†

Toshinori Tsuru,*a   Hironobu Shigemoto,a   Masakoto Kanezashia  and  Tomohisa Yoshiokaa  

* Corresponding authors

a Department of Chemical Engineering, Hiroshima University, Higashi-Hiroshima 739-8527, Japan
E-mail: tsuru@hiroshima-u.acjp

Abstract

Amorphous SiO2 membranes were prepared via a 2-step plasma-enhanced CVD (PECVD) technique at room temperature on porous TiO2/Al2O3 substrates. SiO2 membranes showed molecular sieving properties with a high separation factor for He/N2 and He/H2, and high thermal stability, indicating the successful preparation of high-performance membranes at low temperatures.

Graphical abstract: 2-Step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance

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Article information

DOI
https://doi.org/10.1039/C1CC12147B
Article type
Communication
Submitted
14 Apr 2011
Accepted
02 Jun 2011
First published
17 Jun 2011

Chem. Commun., 2011,47, 8070-8072

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2-Step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance

T. Tsuru, H. Shigemoto, M. Kanezashi and T. Yoshioka, Chem. Commun., 2011, 47, 8070 DOI: 10.1039/C1CC12147B

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