Infrared spectroscopic ellipsometry:a tool for characterizing nanometer layers†

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E. H. Korte and A. Röseler


Abstract

An overview of applications of infrared spectrometric ellipsometry for characterizing samples which consist of a metal, semiconductor or organic layer on a variety of substrates is given. The thicknesses addressed cover the entire nanometer range. Both anisotropy and inhomogeneity of the layers are considered.


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