Atmospheric pressure chemical vapour deposition of tungsten doped vanadium(iv) oxide from VOCl3, water and WCl6

Abstract

Thin films of thermochromic tungsten doped VO₂ on glass substrates were prepared from the atmospheric pressure chemical vapour deposition (APCVD) reaction of VOCl₃,·H₂O and WCl₆. X-Ray diffraction (XRD) and Raman spectroscopy indicated a solid solution V_1−xW_xO₂ (x = 0.003–0.032). XPS studies indicated the tungsten was present as W⁴⁺. The thermochromic properties of the films were investigated by Raman, XRD and reflectance/transmission measurements. These indicated that incorporation of tungsten caused a reduction in the VO₂ thermochromic switching temperature of 19 °C per W atom%. The thermochromic properties of the thin films show great potential for use as an intelligent window coating.