Recent developments in soft, solution processing: one step fabrication of functional double oxide films by hydrothermal-electrochemical methods

Abstract

Based upon thermodynamic considerations, we propose ‘soft, solution processing’, as a means to fabrication of shaped, sized, and controlled advanced materials from aqueous solutions without excess heat, energy consumption, expensive equipment, and precursor(s) as one of the most economical and environmentally friendly preparation techniques for advanced materials. We have succeeded in the fabrication of double oxide thin films such as BaTiO₃ , SrTiO₃ , their solid solutions, and LiNiO₂ at fixed temperatures between 60 and 150 °C by hydrothermal–electrochemical methods. Nucleation and growth of the films takes place at the interface between the alkaline (earth) component in the solutions and anodically treated metal plates. The structures and properties of these films are described. A novel method to fabricate BaTiO3, SrTiO3, their solid solutions, and LiNiO2 at fixed temperatures between 60 and 150 °C by hydrothermal-electrochemical methods. Nucleation and growth of the films takes place at the interface between the alkaline (earth) component in the solutions and anodically treated metal plates. The structures and properties of these films are described. A novel method to fabricate BaTiO₃/SrTiO₃ layered thin films by changing the solution compositions in flow-cell equipment is presented.

References

1. M. Yoshimura, J. Mater. Res., 1998, 13, 796.
2. D. W. van Krevelen, Properties of Polymers, Elsevier Science Publishers, Amsterdam, 1990.
3. R. A. Higgins, Engineering Metalurgy, Edward Arnold, London, 1993.
4. W. D. Kingery, H. K. Bowen and D. R. Uhlmann, Introduction to Ceramics, John Wiley & Sons, New York, 1976.
5. R. A. Ring, Fundamentals of Ceramic Powder Processing and Synthesis, Academic Press, San Diego, 1996.
6. M. Ohring, The Materials Science of Thin Films, Academic Press, New York, 1992.
7. M. Yoshimura and W. Suchanek, Solid State Ionics, 1997, 98, 197.
8. JANAF Thermochemical Tables, National Bureau of Standards, Ametican Chemical Society, American Institute of Physics, 1968–1982.
9. M. M. Lencka and R. E. Riman, Chem. Mater., 1993, 5, 61.
10. Sol–Gel Technology for Thin Films, Fibers, Preforms, Electronics, and Specialty Shapes, ed. L. Klein, Noyes Publ., Mill Road, Park Ridge, New Jersey, 1988.
11. Sol–Gel Optics. Processing and Applications, ed. L. Klein, Kluwer Academic Publishers, Boston/Dordrecht/London, 1994.
12. Modern Electroplating, ed. F. A. Lowenheim, John Wiley & Sons, Inc., New York, 1963.
13. R. Roy, J. Solid State Chem., 1994, 111, 11.
14. C. D. Lokhande and S. H. Pawar, Phys. Status Solidi A, 1989, 111, 17.
15. M. Yoshimura, S.-E. Yoo, M. Hayashi and N. Ishizawa, Jpn. J. Appl. Phys., 1989, 28, L2007.
16. M. Yoshimura, Mater. Res. Soc. Symp. Proc., 1992, 271, 457.
17. Y. Ohba, M. Miyauchi, E. Sakai and M. Daimon, Jpn. J. Appl. Phys., 1995, 34, 5216.
18. A. T. Chien, J. S. Speck and F. F. Lange, J. Mater. Res., 1997, 12, 1176.
19. Q. Chen, Y. Qian, Z. Chen, G. Zhou and Y. Zhang, Mater. Lett., 1995, 22, 93.
20. Q. W. Chen, Y. T. Qian, Z. Y. Chen, Y. B. Jia, G. E. Zhou, X. G. Li and Y. H. Zhang, Phys. Status Solidi A, 1996, 156, 381.
21. M. Abe, Y. Tamaura, Y. Goto, N. Kitamura and M. Gomi, J. Appl. Phys., 1987, 61, 3211.
22. M. Abe, T. Itoh and Y. Tamaura, Mater. Res. Soc. Symp. Proc., 1991, 232, 107.
23. J. S. Lee, T. Itoh and M. Abe, J. Korean Phys. Soc., 1995, 28, 375.
24. J. H. Fendler and F. C. Meldrum, Adv. Mater., 1995, 7, 607.
25. M. Yoshimura, S.-E. Yoo, M. Hayashi and N. Ishizawa, Ceram. Trans., 1990, 15, 427.
26. F. F. Lange, Science, 1996, 273, 903.
27. E. B. Slamovich and I. A. Aksay, J. Am. Ceram. Soc., 1996, 79, 239.
28. M. E. Pilleux and V. M. Fuenzalida, J. Appl. Phys., 1993, 74, 4664.
29. T. Vargas, H. Diaz, C. I. Silva and V. M. Fuenzalida, J. Am. Ceram. Soc., 1997, 80, 213.
30. R. R. Bacsa, G. Rutsch and J. P. Dougherty, J. Mater. Res., 1996, 11, 194.
31. P. Bendale, S. Venigalla, J. R. Ambrose, E. D. Verink Jr. and J. H. Adair, J. Am. Ceram. Soc., 1993, 76, 2619.
32. S.-E. Yoo, M. Hayashi, N. Ishizawa and M. Yoshimura, J. Am. Ceram. Soc., 1990, 73, 2561.
33. K. Kajiyoshi, Y. Hamaji, K. Tomono, T. Kasanami and M. Yoshimura, J. Am. Ceram. Soc., 1996, 79, 613.
34. K. Kajiyoshi, K. Tomono, Y. Hamaji, T. Kasanami and M. Yoshimura, J. Am. Ceram. Soc., 1995, 78, 1521.
35. K. Kajiyoshi and M. Yoshimura, Eur. J. Solid State Inorg. Chem., 1996, 33, 623.
36. M. E. Pilleux, C. R. Grahmann and V. M. Fuenzalida, J. Am. Ceram. Soc., 1994, 77, 1601.
37. K. Kajiyoshi, M. Yoshimura, Y. Hamaji, K. Tomono and T. Kasanami, J. Mater. Res., 1996, 11, 169.
38. M. Yoshimura, W. Urushihara, M. Yashima and M. Kakihana, Intermetallics, 1995, 3, 125.
39. W.-S. Cho and M. Yoshimura, J. Mater. Res., 1997, 12, 833.
40. W. S. Cho and M. Yoshimura, Jpn. J. Appl. Phys., 1997, 36, 1216.
41. W. S. Cho, M. Yashima, M. Kakihana, A. Kudo, T. Sakata and M. Yoshimura, J. Am. Ceram. Soc., 1997, 80, 765.
42. W. S. Cho, M. Yashima, M. Kakihana, A. Kudo, T. Sakata and M. Yoshimura, Appl. Phys. Lett., 1996, 68, 137.
43. A. T. Chien, L. Zhao, M. Colic, J. S. Speck and F. F. Lange, J. Mater. Res., 1998, 13, 649.
44. J. A. Switzer, C. J. Hung, B. E. Breyfogle, M. G. Shumsky, R. Vanleeuwen and T. D. Golden, Science, 1994, 264, 1573.
45. J. A. Switzer, C. J. Hung, L. Y. Huang, F. C. Miller, Y. Zhou, E. R. Raub, M. G. Shumsky and E. W. Bohannan, J. Mater. Res., 1998, 13, 909.
46. F. K. Shokoohi, J. M. Tarascon, B. J. Wilkens, D. Guyomard and C. C. Chang, J. Electrochem. Soc., 1992, 139, 1845.
47. P. Birke, W. F. Chu and W. Weppner, Solid State Ionics, 1997, 93, 1.
48. K. A. Striebel, C. Z. Deng, S. J. Wen and E. J. Cairns, J. Electrochem. Soc., 1996, 143, 1821.
49. S. J. Lee, J. K. Lee, D. W. Kim, H. K. Baik and S. M. Lee, J. Electrochem. Soc., 1996, 143, L268.
50. K. H. Hwang, S. H. Lee and S. K. Joo, J. Electrochem. Soc., 1994, 141, 3296.
51. F. K. Shokoohi, J. M. Tarascon and B. J. Wilkens, Appl. Phys. Lett., 1991, 59, 1260.
52. M. Antaya, K. Cearns, J. S. Preston, J. N. Reimers and J. R. Dahn, J. Appl. Phys., 1994, 76, 2799.
53. M. Antaya, J. R. Dahn, J. S. Preston, E. Rossen and J. N. Reimers, J. Electrochem. Soc., 1993, 140, 575.
54. M. Yoshimura, K. S. Han and S. Tsurimoto, Solid State Ionics, 1998, 106, 39.
55. K. S. Han, P. Krtil and M. Yoshimura, J. Mater. Chem., 1998, 8, 2043.
56. K. S. Han, S. W. Song and M. Yoshimura, Chem. Mater., 1998, 10, 2183.
57. D. D. Macdonald and D. Owen, J. Electrochem. Soc., 1973, 120, 317.
58. H. L. Tuller, Ceram. Trans., 1996, 68, 97.
59. R. J. Gutmann, T. P. Chow, S. Lakshminarayanan, D. T. Price, J. M. Steigerwald, L. You and S. P. Murarka, Thin Solid Films, 1995, 270, 472.
60. J. M. Porter, D. C. Pohl and J. D. Rimstid, in Hydrothermal Experimental Techniques, ed. G. C. Ulmer and H. L. Barnes, John Wiley & Sons, New York, 1987, p. 240.
61. M. Suzuki, J. Ceram. Soc. Jpn., 1995, 103, 1099 (in Japanese).
62. M.-H. Song, Y.-H. Lee, T.-S. Hahn and M.-H. Oh, J. Appl. Phys., 1996, 79, 3744.
63. Q. X. Jia, L. H. Chang and W. A. Anderson, Thin Solid Films, 1995, 259, 264.
64. Z. Q. Shi, Q. X. Jia and W. A. Anderson, J. Electron. Mater., 1991, 20, 939.
65. T. Hayashi and T. Tanaka, Jpn. J. Appl. Phys., 1995, 34, 5100.
66. V. K. Varadan, V. V. Varadan, F. Selmi, Z. Ounaies and K. A. Jose, Proc. SPIE—Int. Soc. Opt. Eng., 1994, 2189, 433.
67. M. Yoshimura, W. Suchanek, T. Watanabe, B. Sakurai and M. Abe, J. Mater. Res., 1998, 13, 875.
68. W. Suchanek, T. Watanabe and M. Yoshimura, Solid State Ionics, 1998, 109, 65.
69. W. Suchanek and M. Yoshimura, J. Am. Ceram. Soc., 1998, in press.
70. D. Elwell and H. J. Scheel, Crystal Growth from High-Temperature Solutions, Academic Press, New York, 1975.
71. W. Suchanek, T. Watanabe, B. Sakurai and M. Yoshimura, Mater. Res. Soc. Symp. Proc., 1998, 517 ) High-Density Magnetic Recording and Integrated Magneto-Optics: Materials and Devices), in press.
72. W. Suchanek and M. Yoshimura unpublished data.