Quantitative X-ray microanalysis of beryllium using a multilayer diffracting device

Abstract

A commercial synthetic Mo-B₄C multilayer X-ray diffracting device with 2d=22.2 nm periodicity was used to extend X-ray microanalysis to the ultra-light elements Be and B in an existing instrument. The spectrometer covers a wavelength range between 5.2 and 13 nm. The wavelength of the Be Kα emission line from elemental Be is λ=11.35 nm and the full width at half maximum is ΔE=7.2 eV. The optimum working voltage U₀ is 10 kV for moderate X-ray mass absorption of the targets. The determination of Be in oxides is less favourable owing to the high mass absorption. U₀ has to be reduced to 5 kV. The chemical shift of the Be Kα line in BeO is Δλ=+0.3 nm relative to pure Be. The successful determination of Be is demonstrated for Be-containing precipitates. The maximum solubility of impurities in annealed industrial Be heats is reported. Further, the analyses of the reaction products of Be with Li₄SiO₄ and Li₂SiO₃ are presented, where Li is a further ultra-light element.

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