The chemistry of volatile waste from silicon wafer processing

(Note: The full text of this document is currently only available in the PDF Version )

Peter L. Timms


Abstract

The semiconductor industry uses extremely pure gases and vapours to produce solid-state devices based on silicon wafers of great chemical and physical sophistication under very clean conditions. However, the waste volatiles from the processes pose a serious environmental threat. This article attempts to show how an increasing armoury of chemical methods is being applied to abate any pollution and to highlight areas where ideal solutions to problems have yet to be found.


References

  1. The Chemistry of the Semiconductor Industry, eds. S. J. Moss and A. Ledwith, Blackie, London, 1987 Search PubMed.
  2. S. C. O'Brien, Chem. Soc. Rev., 1996, 393 RSC.
  3. Encyclopaedia of Analytical Science, ed. A. Townsend, Academic Press, London, 1995, p. 63 Search PubMed.
  4. M. Hayes and K. Woods, Solid State Technol., 1996, 39, 141 CAS.
  5. G. M. Tom, J. V. McManus and B. A. Luxon, U.S. Pat., 5 037 624, 1991 Search PubMed.
  6. O. Koper, Y.-X. Li and K. J. Klabunde, Chem. Mater., 1993, 5, 500 CrossRef CAS.
  7. Y.-X. Li, H. Li and K. J. Klabunde, Environ. Sci. Technol., 1994, 28, 1248 CAS.
  8. J. R. Smith and P. L. Timms, U.S. Pat., 5 213 767, 1993 Search PubMed.
  9. D. Baker, P. J. Mawle and J. R. Smith, Solid State Technol., 1995, 38, 79 CAS.
  10. R. G. Czerepinski and J. L. Margrave, Inorg. Chem., 1963, 2, 875 CrossRef CAS.
  11. S. Decker and K. J. Klabunde, J. Am. Chem. Soc., 1996, 118, 12465 CrossRef CAS.
  12. J. Van Gompel and T. Walling, Semiconductor Int., 1997, 20, 95 Search PubMed.
  13. P. Maroulis, J. Langan, A. Johnson, R. Ridgeway and H. Withers, Semiconductor Int., 1994, 17, 107 Search PubMed.
  14. M. T. Mocella, Mater. Res. Soc. Symp. Proc., 1997, 447, 29 CAS.
  15. PFC Emissions Reduction from Semiconductor Processing Tools, Sixth Status Report on Technology and Industry Activities, E. I. du Pont de Nemours and Co., January 1998(www.dupont.com/zyron/techinfo/status6.html).
  16. G. L. Gutsev and L. Adamowicz, J. Chem. Phys., 1995, 102, 9309 CrossRef CAS.
  17. K. Hiraoka, M. Nasu, S. Fujinaki, E. W. Ignacio and S. Yamabe, Chem. Phys. Lett., 1995, 245, 14 CrossRef CAS.
  18. N. G. Adams, D. Smith, M. Tichy, G. Javahevy, N. D. Twiddy and E. E. Fergusson, J. Chem. Phys., 1989, 91, 4037 CrossRef CAS.
  19. G. C. Saunders, Angew. Chem., Int. Ed. Engl., 1996, 35, 2615 CrossRef CAS.
  20. J. Burdenuic and R. H. Crabtree, Science, 1996, 271, 340 CrossRef CAS.
  21. Jap. Pat., JP 59 10 329, 1984 Search PubMed.
  22. R. S. Clay and D. Husain, J. Chem. Res. (S), 1990, 384 Search PubMed.
  23. D. P. Dufaux and M. Zachariah, Environ. Sci. Technol., 1997, 31, 2223 CrossRef CAS.
  24. R. M. T. Lott, Ph.D. Thesis, University of Bristol, 1997.
  25. J. P. Quin, in Mellors Comprehensive Treatise on Inorganic and Theoretical Chemistry, Longmans, London, 1956, vol. II, Suppl. 1, p. 308 Search PubMed.
  26. R. M. T. Lott and P. L. Timms, Eur. Pat., EP 0 663 233 B1, 1998 Search PubMed.
  27. H. Vogt, A. Fischer, G. Grosser and L. Riesel, Z. Anorg. Allg. Chem., 1987, 551, 223 CAS.
  28. L. White and O. K. Rice, J. Am. Chem. Soc., 1947, 69, 267 CrossRef CAS.
  29. Ger. Pat., DE 4 404 329 A1, 1995 Search PubMed.
  30. C. Scholz and K. Markert, Semicond. Fabtech, ICG Publishing, 4th edn., June 1996, p. 131 Search PubMed.
  31. A. Dakhil, R. M. T. Lott and P. L. Timms, University of Bristol, unpublished work.
  32. M. T. McClear and P. A. Taylor, Eur. Semiconductor, July 1996, 42 Search PubMed.
  33. H. J. Emeleus and K. Stewart, J. Chem. Soc., 1935, 1182 RSC.
  34. S. Koda, Prog. Energy Combust. Sci., 1992, 18, 513 CAS.
  35. E. Sada, H. Kumazawa and S. Hattori, Chem. Eng. Commun., 1987, 57, 95 Search PubMed.
  36. L. Gatterman and E. Ellery, Chem. Ber., 1899, 32, 1114 Search PubMed.
Click here to see how this site uses Cookies. View our privacy policy here.