Issue 16, 1999

Unique polymers via radical diene cyclization: polyspironorbornanes and their application to 193 nm microlithography

Abstract

The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.

Article information

Article type
Paper

Chem. Commun., 1999, 1587-1588

Unique polymers via radical diene cyclization: polyspironorbornanes and their application to 193 nm microlithography

R. P. Meagley, D. Pasini, L. Y. Park and J. M. J. Fréchet, Chem. Commun., 1999, 1587 DOI: 10.1039/A902405K

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