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DOI: 10.1039/A707920F (Paper) Reference Section for: J. Mater. Chem., 1998, 8, 1133-1138

Stability of antiferroelectricity and molecular reorientation in the hexatic smectic IA* phase as studied by X-ray diffraction and NMR spectroscopy

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Yoichi Takanishi, Kouichi Miyachi, Shohei Yoshida, Bo Jin, Huiyong Yin, Ken Ishikawa, Hideo Takezoe and Atsuo Fukuda

Abstract

We have investigated molecular orientation in the hexatic antiferroelectric SIA* phase by X-ray diffraction and nuclear magnetic resonance (NMR) spectroscopy. In the phase transition from SCA* to SIA*, the layer thickness increases and becomes larger than that in SA. The third-order diffraction peak intensity becomes stronger than the second-order one at this transition and increases with decreasing temperature in SIA*. According to the magic angle spinning NMR measurements, on the other hand, the isotropic chemical shift scarcely moves at this transition. These results suggest that the layer structure is reconstructed by the molecular reorientation but not by a molecular conformation change. We have also discussed the stability of antiferroelectricity and the origin of its appearance in hexatic ordering.

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