Alternative approach for the direct determination of silicon and other trace elements in tungsten metal with inductively coupled plasma atomic emission spectrometry

Abstract

In the determination of trace elements in tungsten metal by ICP AES, the tungsten is dissolved in HNO₃–HF to ensure complete dissolution of the analytes. Corrosion problems with HF-containing solutions have been overcome by neutralizing the solution prior to sample introduction. For Si, LOD of 10–20 µg g^–1 were obtained.

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