Epitaxial electro-optical BaTiO₃ films by single-source metal–organic chemical vapour deposition

Abstract

Chemical vapour deposition (CVD) is a promising process for the production of ferroelectric complex oxide films having a large electro-optical coefficient. We report the epitaxial growth of high-quality BaTiO₃ films using a single-source CVD process. A variety of epitaxial relationships have been achieved with BaTiO₃ films grown cube-on-cube on substrates of large lattice mismatched LaAlO₃ and MgO, and «001», «110» and «111» oriented SrTiO₃ . A large quadratic electro-optic coefficient was measured for CVD-prepared BaTiO₃ films. These films also have values of the optic refractive indices and second electro-optic susceptibilities close to those of bulk BaTiO₃ crystals, indicating their excellent quality.

References

1. A. M. Glass, Science, 1987, 235, 1003.
2. M. B. Klein, Photorefractive properties of BaTiO₃, in, Photorefractive Materials and Their Applications, Springer, Berlin, 1988, vol. 1, p. 235.
3. L. A. Wills, B. W. Wessels, D. S. Richeson and T. J. Marks, Appl. Phys. Lett., 1992, 60, 41.
4. C. S. Chern, J. Zhao, Y. Q. Li, P. Lu, P. Norris, B. Gallois, B. Kear, L. Luo, C. J. Maggiore and B. J. Wilkens, Appl. Phys. Lett., 1992, 60, 1144.
5. J. Zhang, R. A. Gradiner, P. S. Kirlin, R. W. Boerstler and J. Steinbeck, Appl. Phys. Lett., 1992, 61, 2884.
6. K. Fujimoto, Y. Kobayashi and K. Kubota, Thin Solid Films, 1989, 169, 249.
7. G. M. Davis and M. C. Gower, Appl. Phys. Lett., 1989, 55, 112.
8. F. Wang, E. Furman and G. H. Haertling, J. Appl. Phys., 1989, 78, 9.
9. H. A. Lu, L. A. Wills, B. W. Wessels, W. P. Lin, T. G. Zhang, G. K. Wong, D. A. Neumayer and T. J. Marks, Appl. Phys. Lett., 1992, 62, 1314.