Comparison of the Performance of a Laboratory-built High Resolution Glow Discharge Mass Spectrometry With That of a Quadrupole Inductively Coupled Plasma (Glow Discharge) Mass Spectrometer for Boron and Gadolinium Isotopic Analysis

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Frederic Chartier and Michel Tabarant


Abstract

A double focusing glow discharge mass spectrometer (HR GDMS system) was developed from a spark source mass spectrometer to allow isotopic measurements directly on solid samples. The effects on signals of the discharge cell geometry, including anode–cathode distance and aperture diameter of the anode, are discussed. A comparison was made, after optimization of operating parameters, between this system and a quadrupole mass spectrometer with an inductively coupled plasma and a glow discharge as ion sources [quadrupole ICP-(GD)MS system]. The comparison included spectral characteristics, isobaric interferences and stability measurements. HR GDMS was applied to B isotope ratio measurements in Zr samples; these measurements cannot be performed with quadrupole GDMS because of an isobaric interference between10B+ and Ar4+. The two GDMS systems were also used for Gd isotopic determinations; however, for large samples (greater than 55 mm in diameter), only HR GDMS offers the possibility of isotopic analysis, owing to the design of the quadrupole GDMS sample holder. ICP-MS was employed to obtain isotopic measurements of these two elements on the same samples after dissolution. The accuracy and precision of the results are discussed and compared with those obtained by thermal ionization mass spectrometry (TIMS), used as a reference technique.


References

  1. J. R. De Laeter, Mass Spectrom. Rev., 1994, 13, 3 CAS.
  2. K. G. Heumann, S. Eisenhut, S. Gallus, E. H. Hebeda, R. Nusko, A. Vengosh and T. Walczyk, Analyst, 1995, 120, 1291 RSC.
  3. G. P. Russ, III, in Applications of Inductively Coupled Plasma Mass Spectrometry, ed. Date, A. R., and Gray, A. L., Blackie, Glasgow and London, 1989, ch. 4, p. 90 Search PubMed.
  4. F. Vanhaecke, L. Moens, R. Dams and P. Taylor, Anal. Chem., 1996, 68, 567 CrossRef CAS.
  5. N. Jakubowski, I. Feldmann and D. Stuewer, Spectrochim. Acta, Part B, 1995, 50, 639 CrossRef.
  6. M. F. Thirlwall and A. J. Walder, Chem. Geol., 1995, 122, 241 CrossRef.
  7. A. J. Walder, I. D. Abell and I. Platzner, Spectrochim. Acta, Part B, 1993, 48, 397 CrossRef.
  8. L. R. Riciputi, D. C. Duckworth, C. M. Barshick and D. H. Smith, Int. J. Mass Spectrom. Ion Processes, 1995, 146/147, 55 CrossRef.
  9. T. Shimamura, T. Takahashi, M. Honda and H. Nagai, J. Anal. At. Spectrom., 1993, 8, 453 RSC.
  10. D. C. Duckworth, C. M. Barshick, D. A. Bostick and D. H. Smith, Appl. Spectrosc., 1993, 47, 243 CAS.
  11. M. Betti, G. Rasmussen and L. Koch, Fresenius' J. Anal. Chem., 1996, 355, 808 CAS.
  12. D. L. Donohue and M. Petck, Anal. Chem., 1991, 63, 740 CrossRef CAS.
  13. G. P. Russ, III and J. M. Bazan, Spectrochim. Acta, Part B, 1987, 42, 49 CrossRef.
  14. D. C. Gregoire, Anal. Chem., 1987, 59, 2479 CrossRef CAS.
  15. H. Hidaka, M. Ebihara and M. Shima, Anal. Chem., 1995, 67, 1437 CrossRef CAS.
  16. J.-C. Dubois, G. Retali and J. Cesario, Int. J. Mass Spectrom. Ion Processes, 1992, 120, 163 CrossRef CAS.
  17. N. C. Porteous, J. N. Walsh and K. E. Jarvis, Analyst, 1995, 120, 1397 RSC.
  18. S. Eisenhut, K. G. Heumann and A. Vengosh, Fresenius' J. Anal. Chem., 1996, 354, 903 CAS.
  19. S. K. Sahoo and A. Masuda, Analyst, 1995, 120, 335 RSC.
  20. Y. Shao and G. Horlick, Spectrochim. Acta, Part B, 1991, 46, 165 CrossRef.
  21. P. J. Turner, in Applications of Plasma Source Mass Spectrometry, ed. Holland, G., and Eaton, A. N., Royal Society of Chemistry, Cambridge, 1991, p. 71 Search PubMed.
  22. S. H. Tan and G. Horlick, Appl. Spectrosc., 1986, 40, 445 CAS.
  23. X. Feng and G. Horlick, J. Anal. At. Spectrom., 1994, 9, 823 RSC.
  24. N. Jakubowski and D. Stuewer, Fresenius' Z. Anal. Chem., 1989, 335, 680 CAS.
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