Aluminium film growth by chemical vapour deposition of AlH3(NMe3)2
Abstract
The surface thermal decomposition mechanism of bistrimethylamine alane [AlH3(Me3N)2] on the Ga rich (4 × 1) GaAs(100) surface was studied by thermal desorption spectroscopy (TDS), high resolution electron energy loss spectroscopy (HREELS), and XPS and was found to result in the deposition of carbon free aluminium films.