Issue 9, 1983

Internal nucleophilic displacements within silanolate ions. A new mechanism of substitution at silicon

Abstract

Unimolecular dissociation of O–(X)Si< species to give X and O[double bond, length half m-dash]Si[double bond splayed right](which immediately reacts with the solvent) is postulated to account for (a) features of the base-catalysed cleavage of R–Si bonds in solutions of RSiMe2OMe (R =m-ClC6H4CH2 or PhC[triple bond, length half m-dash]C) in 5% H2O–MeOH and (b) the rapid conversion of (Me3Si)3CSiPh(OH)I into (Me3Si)3CSiPh(OH)(OMe) by methanolic MeONa.

Article information

Article type
Paper

J. Chem. Soc., Chem. Commun., 1983, 493-495

Internal nucleophilic displacements within silanolate ions. A new mechanism of substitution at silicon

Z. H. Aiube, J. Chojnowski, C. Eaborn and W. A. Stańczyk, J. Chem. Soc., Chem. Commun., 1983, 493 DOI: 10.1039/C39830000493

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