The results of u.v. irradiation of (Me3Si)CSiPh2I in MeOH, n-C6H14, CCl4 Et2O, and PhoMe are interpreted in terms of the formation of cationic as well as free-radical organosilicon intermediates.
C. Eaborn, K. D. Safa, A. Ritter and W. Binder, J. Chem. Soc., Chem. Commun., 1981, 175 DOI: 10.1039/C39810000175
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