SCHEDULED MAINTENANCE:
Oxidation of tertiary alcohols and carboxylic acids by CeIV during u.v. irradiation of CeIV-substrate complexes in an aqueous perchloric acid medium at 77°K leads to the formation of trapped alkyl radicals detected by e.s.r.
D. Greatorex and T. J. Kemp, J. Chem. Soc. D, 1969, 383 DOI: 10.1039/C29690000383
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