Issue 1, 2019

Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

Abstract

The investigation of the photoionization processes of a series of titanium oxo clusters evidenced that doping their organic shell with extended aromatic structures decreases their ionization energy and stabilises the resulting radical cations. Such tunability of their photochemistry arising from ligand exchange gives these hybrid compounds great potential as EUV photoresists.

Graphical abstract: Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

Supplementary files

Article information

Article type
Communication
Submitted
18 Oct 2018
Accepted
28 Nov 2018
First published
04 Dec 2018

J. Mater. Chem. C, 2019,7, 33-37

Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos, J. Mater. Chem. C, 2019, 7, 33 DOI: 10.1039/C8TC05273E

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