Issue 47, 2018

Strong electro-optically active Ni-substituted Pb(Zr0.35Ti0.65)O3 thin films: toward integrated active and durable photonic devices

Abstract

Ferroelectric materials for precise control of light from lasers to optical communications have sparked great interest owing to their large electro-optic (EO) coefficients, low propagation loss, and fast switching time. Here, we report the deposition of highly oriented Ni-doped lead zirconate titanate (PZT) thin films on glass substrates as a novel way to seamlessly connect the electrical, optical, and magnetic domain. Small dielectric dispersion, low dielectric loss, and a large dielectric constant ranging from 102 Hz to 106 Hz were observed at a Ni content of 0.5 mol%. These films show well-saturated ferroelectric hysteresis with a large spontaneous polarization (>30 μC cm−2) and a high Curie temperature (>350 °C). In addition, optical measurements indicate a large refractive index (∼2.43), a low propagation loss (∼4.14 dB cm−1), a fast response time (4.02 μs), and an effective EO coefficient (167.7 pm V−1), which are five times larger than those of the current standard material for EO devices (LiNbO3). More importantly, such films can work well up to 250 °C and retain above 80% of the EO performance at 104 Hz. Finally, the substitution of Ni2+ at the Ti4+ site shows distinct magnetic behaviors. The integration of EO active films could pave the way for future power-efficient, ultrafast switches, and compact integrated nanophotonic and magneto-optic devices.

Graphical abstract: Strong electro-optically active Ni-substituted Pb(Zr0.35Ti0.65)O3 thin films: toward integrated active and durable photonic devices

Supplementary files

Article information

Article type
Paper
Submitted
11 Sep 2018
Accepted
27 Oct 2018
First published
08 Nov 2018

J. Mater. Chem. C, 2018,6, 12919-12927

Strong electro-optically active Ni-substituted Pb(Zr0.35Ti0.65)O3 thin films: toward integrated active and durable photonic devices

M. Zhu, Z. Du, S. S. Chng, S. H. Tsang and E. H. T. Teo, J. Mater. Chem. C, 2018, 6, 12919 DOI: 10.1039/C8TC04576C

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