Performance improvement of a ZnMgO ultraviolet detector by chemical treatment with hydrogen peroxide
Herein, ZnMgO thin film ultraviolet (UV) photodetectors based on metal–semiconductor–metal structure were fabricated on a-plane sapphire substrates by plasma-assisted molecular beam epitaxy. The effect of H2O2 solution treatment on the properties of the ZnMgO thin film and its UV photodetectors was investigated. After immersing the ZnMgO UV photodetector in a H2O2 solution at 100 °C for 3 min, the dark current of the device was reduced by more than one order of magnitude under 1 V bias, whereas the responsivity was slightly decreased. More interestingly, the response speed became much quicker and insensitive to the atmosphere after the treatment of the photodetector with H2O2 solution, which can be attributed to the reduction in the oxygen vacancy defects. Our findings may provide a promising approach for improving the performance of photodetectors.