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Issue 6, 2014
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Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment

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Abstract

We show here that a highly effective diffraction grating can be embedded into a nanoparticulate TiO2 film via imprinting combined with TiCl4 treatment. A thin TiO2 film spin-coated on a glass substrate was patterned by imprinting and this patterned layer was TiCl4-treated with a higher concentration than for a thicker over-coated TiO2 film. Due to the refractive index difference between the two layers, the incident light could be strongly diffracted. Different types of gratings have been incorporated into the films. A line grating with a 2 μm period and 1.2 μm thickness generated diffracted beams up to 3rd-order, with total diffraction efficiencies over 90% at 633 nm. This method has potential applications in TiO2-based photovoltaic and photocatalytic devices.

Graphical abstract: Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment

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Article information


Submitted
12 Oct 2013
Accepted
11 Nov 2013
First published
12 Nov 2013

J. Mater. Chem. C, 2014,2, 981-985
Article type
Paper

Nanostructured TiO2 diffraction grating fabricated via imprinting and TiCl4 treatment

J. Lee, J. Park and M. Lee, J. Mater. Chem. C, 2014, 2, 981
DOI: 10.1039/C3TC32018A

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