Issue 44, 2018

Structure–property relationships describing the buried interface between silicon oxide overlayers and electrocatalytic platinum thin films

Abstract

Encapsulation of an active electrocatalyst with a permeable overlayer is an attractive approach to simultaneously enhance its stability, activity, and selectivity. However, the structure–property relationships that govern the performance of encapsulated electrocatalysts are poorly understood, especially those describing the electrocatalytic behavior of the buried interface between the overlayer and active electrocatalyst. Using planar silicon oxide (SiOx)-encapsulated platinum (Pt)/titanium (Ti) bilayer thin films as model electrodes, the present study investigates the physical and electrochemical properties of the SiOx|Pt buried interface. Through a combination of X-ray photoelectron spectroscopy and electroanalytical measurements, it is revealed that a platinum oxide (PtOx) interlayer can exist between the SiOx overlayer and Pt thin film. The thickness and properties of the PtOx interlayer can be altered by modifying (i) the thickness of the SiOx overlayer or (ii) the thickness of the Pt layer, which may expose the buried interface to oxophilic Ti. Importantly, SiOx|Pt electrodes based on ultrathin Pt/Ti bilayers possess thinner PtOx interlayers while exhibiting reduced permeabilities for Cu2+ and H+ and enhanced stability during cycling in 0.5 M H2SO4. These findings highlight the tunability of buried interfaces while providing new insights that are needed to guide the design of complex electrocatalysts that contain them.

Graphical abstract: Structure–property relationships describing the buried interface between silicon oxide overlayers and electrocatalytic platinum thin films

Supplementary files

Article information

Article type
Paper
Submitted
19 Jul 2018
Accepted
10 Oct 2018
First published
10 Oct 2018

J. Mater. Chem. A, 2018,6, 22287-22300

Author version available

Structure–property relationships describing the buried interface between silicon oxide overlayers and electrocatalytic platinum thin films

M. E. S. Beatty, H. Chen, N. Y. Labrador, B. J. Lee and D. V. Esposito, J. Mater. Chem. A, 2018, 6, 22287 DOI: 10.1039/C8TA06969G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements