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Issue 10, 2018
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Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

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Abstract

We report a new atomic layer deposition (ALD) process for nickel carbide (Ni3C). The process uses bis(1,4-di-tert-butyl-1,3-diazabutadienyl)nickel(II) and H2 plasma and is able to produce smooth, pure, crystalline Ni3C thin films in an ideal self-limiting ALD growth fashion. Using this ALD process, a uniform thin layer of Ni3C can be conformally coated on carbon nanotubes (CNTs) to afford a core–shell nanostructured Ni3C/CNT composite. The ALD-prepared Ni3C/CNT composite is demonstrated to show excellent performance for supercapacitors and electrocatalytic hydrogen evolution.

Graphical abstract: Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

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Supplementary files

Article information


Submitted
20 Nov 2017
Accepted
17 Dec 2017
First published
18 Dec 2017

J. Mater. Chem. A, 2018,6, 4297-4304
Article type
Paper

Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

W. Xiong, Q. Guo, Z. Guo, H. Li, R. Zhao, Q. Chen, Z. Liu and X. Wang, J. Mater. Chem. A, 2018, 6, 4297
DOI: 10.1039/C7TA10202J

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