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Issue 10, 2013
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Directed self-assembly of block copolymers for universal nanopatterning

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Abstract

Block copolymers (BCP) are self-assembling polymeric materials that have been extensively investigated for several decades. Recently, directed self-assembly (DSA) of BCPs has received enormous research attention from both academia and industry as next-generation nanolithography technology. This article provides a brief introduction to (i) the spontaneous and directed self-assembly of BCPs, (ii) the orientation and lateral ordering of BCP nanopatterns and their relationships with DSA strategies, (iii) various potential applications of BCP nanopatterning, and (iv) mussel-inspired BCP nanopatterning for arbitrary substrate materials including low surface energy materials.

Graphical abstract: Directed self-assembly of block copolymers for universal nanopatterning

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Article information


Submitted
04 Nov 2012
Accepted
03 Jan 2013
First published
01 Feb 2013

Soft Matter, 2013,9, 2780-2786
Article type
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Directed self-assembly of block copolymers for universal nanopatterning

B. H. Kim, J. Y. Kim and S. O. Kim, Soft Matter, 2013, 9, 2780
DOI: 10.1039/C2SM27535J

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