Issue 5, 2020, Issue in Progress

HfS2/MoTe2 vdW heterostructure: bandstructure and strain engineering based on first-principles calculation

Abstract

In this study, a multilayered van der Waals (vdW) heterostructure, HfS2/MoTe2, was modeled and simulated using density functional theory (DFT). It was found that the multilayers (up to 7 layers) are typical indirect bandgap semiconductors with an indirect band gap varying from 0.35 eV to 0.51 eV. The maximum energy value of the valence band (VBM) and the minimum energy value of the conduction band (CBM) of the heterostructure were found to be dominated by the MoTe2 layer and the HfS2 layer, respectively, characterized as type-II band alignment, leading to potential photovoltaic applications. Optical spectra analysis also revealed that the materials have strong absorption coefficients in the visible and ultraviolet regions, which can be used in the detection of visible and ultraviolet light. Under an external strain perpendicular to the layer plane, the heterostructure exhibits a general transition from semiconductor to metal at a critical interlayer-distance of 2.54 Å. The carrier effective mass and optical properties of the heterostructures can also be modulated under external strain, indicating a good piezoelectric effect in the heterostructure.

Graphical abstract: HfS2/MoTe2 vdW heterostructure: bandstructure and strain engineering based on first-principles calculation

Article information

Article type
Paper
Submitted
04 Oct 2019
Accepted
20 Dec 2019
First published
15 Jan 2020
This article is Open Access
Creative Commons BY license

RSC Adv., 2020,10, 2615-2623

HfS2/MoTe2 vdW heterostructure: bandstructure and strain engineering based on first-principles calculation

X. Yang, X. Qin, J. Luo, N. Abbas, J. Tang, Y. Li and K. Gu, RSC Adv., 2020, 10, 2615 DOI: 10.1039/C9RA10087C

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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