Issue 62, 2019

Inkjet assisted fabrication of planar biocompatible memristors

Abstract

In this study we address a novel design of a planar memristor and investigate its biocompatibility. An experimental prototype of the proposed memristor assembly has been manufactured using a hybrid nanofabrication method, combining sputtering of electrodes, patterning the insulating trenches, and filling them with a memristive substance. To pattern the insulating trenches, we have examined two nanofabrication techniques employing either a focused ion beam or a cantilever tip of an atomic force microscope. Inkjet printing has been used to fill the trenches with the functional titania ink. The experimental prototypes have qualitatively demonstrated memristive current–voltage behavior, as well as high biocompatibility.

Graphical abstract: Inkjet assisted fabrication of planar biocompatible memristors

Associated articles

Article information

Article type
Paper
Submitted
07 Oct 2019
Accepted
25 Oct 2019
First published
05 Nov 2019
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2019,9, 35998-36004

Inkjet assisted fabrication of planar biocompatible memristors

G. A. Illarionov, D. S. Kolchanov, O. A. Kuchur, M. V. Zhukov, E. Sergeeva, V. V. Krishtop, A. V. Vinogradov and M. I. Morozov, RSC Adv., 2019, 9, 35998 DOI: 10.1039/C9RA08114C

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