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Issue 36, 2019, Issue in Progress
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Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation

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Abstract

Thin film encapsulation (TFE) is one of the key problems that hinders the lifetime and widespread commercialization of flexible organic light-emitting diodes (OLEDs). In this work, TFE of OLEDs with Al2O3/alucone laminates grown by atomic layer deposition (ALD) and molecular layer deposition (MLD) as moisture barriers were demonstrated. The barrier performances of Al2O3/alucone laminates with respect to the individual layer thickness and the number of dyads were investigated. It was found that alucone with suitable layer thickness could reduce the permeation to the defect zones of the inorganic layer by prolonging the permeation pathway, sequentially improving the moisture barrier performance. The water vapor transmission rate (WVTR) could be further lowered with increasing the number of dyads of the laminates, the WVTR value reached 1.44 × 10−4 g per m2 per day for laminates with 5.5 dyads. These laminates were incorporated in OLEDs with pixel define layer (PDL), and were found to be able to evidently prolong the lifetime of the OLED.

Graphical abstract: Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation

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Article information


Submitted
19 Mar 2019
Accepted
27 Jun 2019
First published
04 Jul 2019

This article is Open Access

RSC Adv., 2019,9, 20884-20891
Article type
Paper

Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation

G. Chen, Y. Weng, F. Sun, X. Zhou, C. Wu, Q. Yan, T. Guo and Y. Zhang, RSC Adv., 2019, 9, 20884
DOI: 10.1039/C9RA02111F

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