Tunable surface topography in fluoropolymers using photo-embossing

Abstract

Novel methods that allow creation and tunable control of surface relief in polymer films are of key interest in the search for novel low surface energy materials. For example, photochemically cross-linked (UV-cured) high-performance fluoropolymer films with an engineered surface relief of precisely defined shapes and dimensions could have widespread applications. Here, we report a fabrication method based on photo-embossing that provides the ability to create surface relief in fluorinated elastomers. The height and shape of the surface relief structures can be altered as desired by changing the processing conditions such as energy dose, monomer composition and the added solvent volumes. Surface relief structures with heights of up to 9 μm have been obtained using a photomask with a 40 μm pitch. We demonstrate that surface relief structures with a broad range of shapes and dimensions can be created if appropriate photomasks are available.