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Issue 113, 2015
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Effect of microwave irradiation on reduction of graphene oxide films

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Abstract

In this study, the effect of microwave irradiation on reduction of graphene oxide films was investigated. The few-layer graphene (FLG) sheets were prepared by the electrochemical exfoliated method. The reduction process was completed with a microwave power as low as 42 W below a temperature of 250 °C in air. The Raman and XPS spectra demonstrated that a larger amount of oxygen functional groups were removed by microwave irradiation, which is much more effective than the usual method of mild-thermal treatment at 250 °C for 30 min. The FLG films treated by microwave irradiation showed a low value of sheet resistance around 6 × 103 Ω □−1. The results demonstrate that the use of microwave irradiation provides a simple and effective method for eliminating oxygen functional groups to produce highly conductive graphene films.

Graphical abstract: Effect of microwave irradiation on reduction of graphene oxide films

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Article information


Submitted
18 Sep 2015
Accepted
23 Oct 2015
First published
23 Oct 2015

RSC Adv., 2015,5, 92940-92946
Article type
Communication

Effect of microwave irradiation on reduction of graphene oxide films

H. J. Han, Y. N. Chen and Z. J. Wang, RSC Adv., 2015, 5, 92940
DOI: 10.1039/C5RA19268D

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