Jump to main content
Jump to site search

Issue 8, 2015
Previous Article Next Article

Fabrication of glass-based microfluidic devices with dry film photoresists as pattern transfer masks for wet etching

Author affiliations

Abstract

A simple, cheap and rapid method is developed to fabricate glass-based microfluidic devices with dry film photoresists (DFR) as pattern transfer masks for wet etching. In this method, the DFR mask for wet etching can be easily achieved by a one-step lamination, and no expensive facilities and materials are used; therefore, both the difficulty and the cost of fabrication of glass microchips with etched microchannels are reduced greatly compared with those in conventional methods. With the DFR mask, mass-production of glass microchips can be achieved efficiently and controllably in general laboratories. The fabricated glass microfluidic devices feature very flexible design of microchannels, good chemical compatibility and optical properties, easy modification of channel surface wettability, mass producibility and satisfactory reproducibility. We demonstrate the utilities of fabricated glass microchips in the preparation of monodisperse water-in-oil (W/O) and oil-in-water (O/W) emulsions, and the formation of a stable laminar flow interface and concentration gradient in microchannels.

Graphical abstract: Fabrication of glass-based microfluidic devices with dry film photoresists as pattern transfer masks for wet etching

Back to tab navigation

Supplementary files

Publication details

The article was received on 11 Nov 2014, accepted on 11 Dec 2014 and first published on 11 Dec 2014


Article type: Paper
DOI: 10.1039/C4RA15907A
RSC Adv., 2015,5, 5638-5646

  •   Request permissions

    Fabrication of glass-based microfluidic devices with dry film photoresists as pattern transfer masks for wet etching

    L. Zhang, W. Wang, X. Ju, R. Xie, Z. Liu and L. Chu, RSC Adv., 2015, 5, 5638
    DOI: 10.1039/C4RA15907A

Search articles by author

Spotlight

Advertisements