Issue 2, 2015

Direct growth of etch pit-free GaN crystals on few-layer graphene

Abstract

We report high-quality GaN crystals grown directly on graphene layers without a buffer layer by metal–organic chemical vapour deposition. Photoluminescence and Raman spectra revealed that GaN crystals grown on graphene layers had mild strain as compared to those grown on sapphire and SiO2 substrates. Etch pits were not observed on the surface of GaN/graphene, in which threading dislocations were diminished inside the bulk. This is markedly different from GaN/sapphire, in which threading dislocations were present on GaN surfaces. This opens a new possibility that graphene with π electrons and hexagonal symmetry could be an ideal substrate for GaN crystal growth instead of expensive sapphire substrates.

Graphical abstract: Direct growth of etch pit-free GaN crystals on few-layer graphene

Supplementary files

Article information

Article type
Paper
Submitted
17 Oct 2014
Accepted
27 Nov 2014
First published
27 Nov 2014

RSC Adv., 2015,5, 1343-1349

Author version available

Direct growth of etch pit-free GaN crystals on few-layer graphene

S. J. Chae, Y. H. Kim, T. H. Seo, D. L. Duong, S. M. Lee, M. H. Park, E. S. Kim, J. J. Bae, S. Y. Lee, H. Jeong, E. Suh, C. W. Yang, M. S. Jeong and Y. H. Lee, RSC Adv., 2015, 5, 1343 DOI: 10.1039/C4RA12557F

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