Issue 85, 2014

A stochastic route to simulate the growth of porous anodic alumina

Abstract

Porous anodic alumina (PAA) film is composed of highly ordered and controllable structures, and their extensive application requires the understanding of their growing mechanism. Herein, we present a localized oxidation model to unravel the phenomena of PAA growth, showing that random processes converge into an ordered formation due to the unique characteristics of ion transport confinement in alumina. The anodizing voltage shows a quadratic relationship with barrier layer depth. In addition, we predict the furcate conditions of PAA and the voltage threshold to produce a PAA by our model.

Graphical abstract: A stochastic route to simulate the growth of porous anodic alumina

Supplementary files

Article information

Article type
Paper
Submitted
23 Jun 2014
Accepted
28 Aug 2014
First published
28 Aug 2014

RSC Adv., 2014,4, 45074-45081

A stochastic route to simulate the growth of porous anodic alumina

J. Li, Z. Wu, J. Xu, C. Li, H. Chen and X. Xia, RSC Adv., 2014, 4, 45074 DOI: 10.1039/C4RA08834D

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