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Issue 56, 2014
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Towards Si@SiO2 core–shell, yolk–shell, and SiO2 hollow structures from Si nanoparticles through a self-templated etching–deposition process

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Abstract

Si@SiO2 core–shell, yolk–shell, and SiO2 hollow structures can be obtained when Si nanoparticles are simply treated with ammonia–water–ethanol solution at room temperature. Their formation mechanism is attributed to the self-templated etching–deposition process.

Graphical abstract: Towards Si@SiO2 core–shell, yolk–shell, and SiO2 hollow structures from Si nanoparticles through a self-templated etching–deposition process

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Article information


Submitted
14 Mar 2014
Accepted
09 Jun 2014
First published
09 Jun 2014

RSC Adv., 2014,4, 29435-29438
Article type
Communication
Author version available

Towards Si@SiO2 core–shell, yolk–shell, and SiO2 hollow structures from Si nanoparticles through a self-templated etching–deposition process

J. Niu, S. Zhang, Y. Niu, R. Song, H. Song, X. Chen, J. Zhou and S. Hong, RSC Adv., 2014, 4, 29435
DOI: 10.1039/C4RA02236J

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