Issue 32, 2014

A facile chemoselective deprotection of aryl silyl ethers using sodium hydride/DMF and in situ protection of phenol with various groups

Abstract

An efficient method for the selective removal of aryl silyl protection using NaH in DMF solvent is developed. The method is rapid, operationally simple and can be carried out at room temperature. Excellent chemoselectivity and high yields of phenol products are other advantages of this method. A one-pot desilylation and reprotection as aryl alkyl ethers and esters has also been demonstrated.

Graphical abstract: A facile chemoselective deprotection of aryl silyl ethers using sodium hydride/DMF and in situ protection of phenol with various groups

Supplementary files

Article information

Article type
Communication
Submitted
29 Jan 2014
Accepted
25 Mar 2014
First published
26 Mar 2014

RSC Adv., 2014,4, 16438-16443

Author version available

A facile chemoselective deprotection of aryl silyl ethers using sodium hydride/DMF and in situ protection of phenol with various groups

R. A. Fernandes, S. P. Gholap and S. V. Mulay, RSC Adv., 2014, 4, 16438 DOI: 10.1039/C4RA00842A

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