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Issue 39, 2013
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Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array

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Abstract

We present a simple micropatterning process to create a closed microchamber array with an extracellular matrix (ECM). The process includes homogeneous coating of the array with the ECM, micropatterned decomposition by plasma oxidation with physical masking, and subsequent sealing. These processes are sufficiently simple to enable scaled-up production of microchamber arrays coated with ECMs.

Graphical abstract: Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array

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Publication details

The article was received on 14 Jun 2013, accepted on 23 Jul 2013 and first published on 24 Jul 2013


Article type: Paper
DOI: 10.1039/C3RA42976H
RSC Adv., 2013,3, 17749-17754

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    Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array

    K. Hattori, R. Yoshimitsu, S. Sugiura, A. Maruyama, K. Ohnuma and T. Kanamori, RSC Adv., 2013, 3, 17749
    DOI: 10.1039/C3RA42976H

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