Issue 39, 2013

Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array

Abstract

We present a simple micropatterning process to create a closed microchamber array with an extracellular matrix (ECM). The process includes homogeneous coating of the array with the ECM, micropatterned decomposition by plasma oxidation with physical masking, and subsequent sealing. These processes are sufficiently simple to enable scaled-up production of microchamber arrays coated with ECMs.

Graphical abstract: Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array

Supplementary files

Article information

Article type
Paper
Submitted
14 Jun 2013
Accepted
23 Jul 2013
First published
24 Jul 2013

RSC Adv., 2013,3, 17749-17754

Masked plasma oxidation: simple micropatterning of extracellular matrix in a closed microchamber array

K. Hattori, R. Yoshimitsu, S. Sugiura, A. Maruyama, K. Ohnuma and T. Kanamori, RSC Adv., 2013, 3, 17749 DOI: 10.1039/C3RA42976H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements