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Issue 23, 2013
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One-step Sn4+-based anodic deposition for flattening of fluorine-doped tin oxide enabling large transmittance enhancements

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Abstract

A novel, facile, one-step Sn4+-based anodic deposition method was developed to flatten fluorine-doped tin oxide (FTO) layer, leading to a significant enhancement in visible light transmittances, from 79 to 85%. The Sn2+ necessary for the anodic deposition of SnO2 was generated in situ from the starting Sn4+ such that a slow and balanced deposition and acid-etching of SnO2 became possible. Furthermore, the fluoride ions released from the acid-etching of the starting FTO layer were later incorporated into the newly deposited SnO2 to make it fluorine-doped, giving rise to the formation of the conductive, much flattened FTO layer. The flattening of the FTO layer led to a significant light scattering reduction at the FTO-air interface and thus enhanced the light transmittances.

Graphical abstract: One-step Sn4+-based anodic deposition for flattening of fluorine-doped tin oxide enabling large transmittance enhancements

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Article information


Submitted
25 Jan 2013
Accepted
03 Apr 2013
First published
08 Apr 2013

RSC Adv., 2013,3, 9011-9015
Article type
Paper

One-step Sn4+-based anodic deposition for flattening of fluorine-doped tin oxide enabling large transmittance enhancements

K. Lee and S. Lu, RSC Adv., 2013, 3, 9011
DOI: 10.1039/C3RA40416A

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