Jump to main content
Jump to site search

Issue 20, 2020
Previous Article Next Article

Photo-induced electrodeposition of metallic nanostructures on graphene

Author affiliations

Abstract

Graphene, a single atomic layer of sp2 hybridized carbon, is a promising material for future devices due to its excellent optical and electrical properties. Nevertheless, for practical applications, it is essential to deposit patterned metals on graphene in the micro and nano-meter scale in order to inject electrodes or modify the 2D film electrical properties. However, conventional methods for depositing patterned metals such as lift-off or etching leave behind contamination. This contamination has been demonstrated to deteriorate the interesting properties of graphene such as its carrier mobility. Therefore, to fully exploit the unique properties of graphene, the controlled and nano-patterned deposition of metals on graphene films without the use of a sacrificial resist is of significant importance for graphene film functionalization and contact deposition. In this work, we demonstrate a practical and low-cost optical technique of direct deposition of metal nano-patterned structures without the need for a sacrificial lift-off resist. The technique relies on the laser induced reduction of metal ions on a graphene film. We demonstrate that this deposition is optically driven, and the resolution is limited only by the diffraction limit of the light source being used. Patterned metal features as small as 270 nm in diameter are deposited using light with a wavelength of 532 nm and a numerical aperture of 1.25. Deposition of different metals such as Au, Ag, Pd, Pb and Pt is shown. Additionally, change in the Fermi level of the graphene film through the nano-patterned metal is demonstrated through the electrical characterization of four probe field effect transistors.

Graphical abstract: Photo-induced electrodeposition of metallic nanostructures on graphene

Back to tab navigation

Supplementary files

Article information


Submitted
03 Feb 2020
Accepted
13 Apr 2020
First published
13 Apr 2020

Nanoscale, 2020,12, 11063-11069
Article type
Paper
Author version available

Photo-induced electrodeposition of metallic nanostructures on graphene

K. Xia, W. Chiang, C. J. Lockhart de la Rosa, Y. Fujita, S. Toyouchi, H. Yuan, J. Su, H. Masuhara, S. De Gendt, S. De Feyter, J. Hofkens and H. Uji-i, Nanoscale, 2020, 12, 11063 DOI: 10.1039/D0NR00934B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.


Social activity

Search articles by author

Spotlight

Advertisements