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Issue 44, 2018
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Atomic layer deposition for membrane interface engineering

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In many applications, interfaces govern the performance of membranes. Structure, chemistry, electrostatics, and other properties of interfaces can dominate the selectivity, flux, fouling resistance, and other critical aspects of membrane functionality. Control over membrane interfacial properties, therefore, is a powerful means of tailoring performance. In this Minireview, we discuss the application of atomic layer deposition (ALD) and related techniques in the design of novel membrane interfaces. We discuss recent literature in which ALD is used to (1) modify the surface chemistry and interfacial properties of membranes, (2) tailor the pore sizes and separation characteristics of membranes, and (3) enable novel advanced functional membranes.

Graphical abstract: Atomic layer deposition for membrane interface engineering

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Publication details

The article was received on 07 Oct 2018, accepted on 30 Oct 2018 and first published on 30 Oct 2018

Article type: Minireview
DOI: 10.1039/C8NR08114J
Nanoscale, 2018,10, 20505-20513

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    Atomic layer deposition for membrane interface engineering

    H. Yang, R. Z. Waldman, Z. Chen and S. B. Darling, Nanoscale, 2018, 10, 20505
    DOI: 10.1039/C8NR08114J

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