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Issue 10, 2013
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Direct and accurate patterning of plasmonic nanostructures with ultrasmall gaps

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Abstract

We report an improved method to directly and accurately fabricate plasmonic nanostructures with ultrasmall gaps. The fabrication is based on high-resolution focused ion beam milling with closely packed nanoring patterns. With fine and precise adjustment of the ion beam, elegant plasmonic nanostructures with ultrasmall dimensions down to 10 nm are achieved. We also show that the gap dimensions have a strong effect on the optical reflectance and transmittance of the plasmonic nanostructures. Measured results show reasonable agreement with finite-difference time-domain calculations. Our approach could find promising applications in plasmon-assisted sensing and surface-enhanced spectroscopy.

Graphical abstract: Direct and accurate patterning of plasmonic nanostructures with ultrasmall gaps

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Publication details

The article was received on 05 Feb 2013, accepted on 07 Mar 2013 and first published on 12 Mar 2013


Article type: Paper
DOI: 10.1039/C3NR00655G
Citation: Nanoscale, 2013,5, 4309-4313

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    Direct and accurate patterning of plasmonic nanostructures with ultrasmall gaps

    G. Si, Y. Zhao, J. Lv, F. Wang, H. Liu, J. Teng and Y. J. Liu, Nanoscale, 2013, 5, 4309
    DOI: 10.1039/C3NR00655G

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