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Issue 22, 2013
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Contamination of PDMS microchannels by lithographic molds

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Abstract

By use of synchrotron X-ray fluorescence and Rutherford backscattering spectrometry, we show the SU-8 soft lithographic process contaminates PDMS. Residues of the antimony containing photoinitiator are transferred from the master mold to the surface of PDMS, uncontrollably intensifying the surface potential, leading to electroosmotic flow variability in PDMS microfluidic devices.

Graphical abstract: Contamination of PDMS microchannels by lithographic molds

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Supplementary files

Article information


Submitted
27 May 2013
Accepted
05 Sep 2013
First published
05 Sep 2013

Lab Chip, 2013,13, 4312-4316
Article type
Communication

Contamination of PDMS microchannels by lithographic molds

A. J. Bubendorfer, B. Ingham, J. V. Kennedy and W. M. Arnold, Lab Chip, 2013, 13, 4312
DOI: 10.1039/C3LC50641J

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