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Issue 22, 2013
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Contamination of PDMS microchannels by lithographic molds

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Abstract

By use of synchrotron X-ray fluorescence and Rutherford backscattering spectrometry, we show the SU-8 soft lithographic process contaminates PDMS. Residues of the antimony containing photoinitiator are transferred from the master mold to the surface of PDMS, uncontrollably intensifying the surface potential, leading to electroosmotic flow variability in PDMS microfluidic devices.

Graphical abstract: Contamination of PDMS microchannels by lithographic molds

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Publication details

The article was received on 27 May 2013, accepted on 05 Sep 2013 and first published on 05 Sep 2013


Article type: Communication
DOI: 10.1039/C3LC50641J
Lab Chip, 2013,13, 4312-4316

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    Contamination of PDMS microchannels by lithographic molds

    A. J. Bubendorfer, B. Ingham, J. V. Kennedy and W. M. Arnold, Lab Chip, 2013, 13, 4312
    DOI: 10.1039/C3LC50641J

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