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Issue 16, 2013
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Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds

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Abstract

We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior.

Graphical abstract: Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds

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Publication details

The article was received on 13 Feb 2013, accepted on 07 Jun 2013 and first published on 07 Jun 2013


Article type: Communication
DOI: 10.1039/C3LC50202C
Lab Chip, 2013,13, 3188-3191

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    Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds

    H. Lim, J. Ryu, G. Kim, K. Choi, S. Lee and J. Lee, Lab Chip, 2013, 13, 3188
    DOI: 10.1039/C3LC50202C

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