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Issue 14, 2009
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Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

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Abstract

A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as “liquid etch mask”. Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to ∼1 while in an inexpensive and convenient manner.

Graphical abstract: Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

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Article information


Submitted
09 Mar 2009
Accepted
18 May 2009
First published
26 May 2009

Lab Chip, 2009,9, 1994-1996
Article type
Communication

Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

X. Mu, Q. Liang, P. Hu, K. Ren, Y. Wang and G. Luo, Lab Chip, 2009, 9, 1994
DOI: 10.1039/B904769G

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