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Issue 29, 2012
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Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

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Abstract

We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd2+ on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be obtained. Moreover, this work is the first experimental demonstration of hydrogen adsorption on Pd adlayers.

Graphical abstract: Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

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Publication details

The article was received on 04 Apr 2012, accepted on 23 May 2012 and first published on 24 May 2012


Article type: Communication
DOI: 10.1039/C2JM32111D
J. Mater. Chem., 2012,22, 14337-14340

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    Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

    M. I. Muglali, A. Bashir, A. Birkner and M. Rohwerder, J. Mater. Chem., 2012, 22, 14337
    DOI: 10.1039/C2JM32111D

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