Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 3, 2011
Previous Article Next Article

Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography

Author affiliations

Abstract

A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive zirconyl 2-ethylhexanoate is presented for the fabrication of both amorphous and crystalline zirconium dioxide (ZrO2) nanostructures. Upon annealing at 400 °C for 1 h, the lateral shrinkage and thickness shrinkage of ZrO2 nanostructures were 69.8 and 66.7%, respectively, indicating an isotropic volume loss. During UV irradiation and annealing treatment, the refractive index of UV-irradiated ZrO2 film is gradually increased by improvement in the packing density and crystallinity of the film. With increasing UV exposure time and annealing temperature, the optical band gap (Eg) of the UV-irradiated ZrO2 film is red-shifted from 5.745 to 5.265 eV, due to the removal of organic groups and the resultant densification of the film during the photochemical reaction and the heat-induced increase in the crystallinity of the film. These results suggest that the refractive index and optical Eg of ZrO2 nanostructures could be controlled by tuning the conditions of UV exposure time and annealing treatment. Nanopatterns of ZrO2, fabricated by direct UV-assisted nanoimprint lithography, are potential candidates for protective coatings for optical mirrors and filters, e.g. high-reflectivity mirrors and broadband interference filters, as well as active electro-optical devices where ordered surface nanostructures are necessary.

Graphical abstract: Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography

Back to tab navigation

Supplementary files

Article information


Submitted
11 May 2010
Accepted
25 Oct 2010
First published
23 Nov 2010

J. Mater. Chem., 2011,21, 657-662
Article type
Paper

Facile nanopatterning of zirconium dioxide films via direct ultraviolet-assisted nanoimprint lithography

H. Park, X. Zhang, S. Lee, K. Kim, D. Choi, J. Choi, J. Lee, E. Lee, H. Park, R. H. Hill and J. Jeong, J. Mater. Chem., 2011, 21, 657
DOI: 10.1039/C0JM01403F

Search articles by author

Spotlight

Advertisements