High voltage polymer solar cell patterned with photolithography

Abstract

An acid-sensitive semiperfluoroalkyl resorcinarene has recently been demonstrated as an effective photoresist for the photolithographic patterning of organic semiconductor materials. In this work, we show that it can be used to pattern polymer solar cells fabricated from a blend of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C₆₁ butyric acid methyl ester (PCBM), so as to obtain high open circuit voltages (V_oc). An array of 300 solar cells in series, with a period of 50 µm, achieved a V_oc of 90 V and a power conversion efficiency (PCE) of 0.3%.